In recent years our customers have expanded their use of and dependency on organic solvents and process fluids. PRECILAB takes great pride in the ability to handle and analyze the emerging generation of high purity organic solvents. Analysis for trace metals in organic solvents has been a difficult problem for many laboratories as the demands for ultra-high purity solvents require hybrid techniques or expensive sample introduction systems. We specialize in this area and can provide quick-turn analytical results for even the most problematic organic chemicals. Some of our customers are now involved in many emerging technologies such as lithium ion-battery manufacturing, nano-materials and bio-printing to name a few.
PRECILAB has a GC-FID which can be used for organic solvent assay and high-level impurity testing. The GC-MS is used for determination and quantification of impurities in organic solvents. PRECILAB also has a Turbo Vap in which we can concentrate many solvents to assist in determining impurities without contaminating the sample.
Analyzed – Typical semiconductor chemicals and solvents.
TRACES ICPMS/OES | IC-ANIONS | IC-CATIONS | ASSAY | K-F [WATER] | |
---|---|---|---|---|---|
Acetone | |||||
Cyclohexanone | |||||
Cyclopentanone | |||||
Di-Acetone alcohol | |||||
EBR’s | |||||
EEP | |||||
Ethanol | |||||
Ethyl Lactate | |||||
Ethylene Glycol | |||||
Ethylenediamine | |||||
GBL | |||||
Hexanone | |||||
HMDS | |||||
IPA | |||||
Isoamyl alcohol | |||||
Isobutyl isobutyrate | |||||
MEK | |||||
Methanol | |||||
Methyl isobutyl carbinol | |||||
Methyl methoxy propionate | |||||
MIBK | |||||
MPK | |||||
NBA | |||||
n-Butanol | |||||
NMP | |||||
n-Propanol | |||||
PGMEA | |||||
Propylene Glycol | |||||
Strippers | |||||
TEOS | |||||
Tetrahydrofuran | |||||
Toluene | |||||
Triethanolamine | |||||
Xylene |
Acronym | Common Chemical Name |
---|---|
EBR’s | Edge Bead Removers [related to the Photoresist removal] |
EEP | Ethyl 3-EthoxyPropionate |
GBL | Gamma Butyro Lactone |
MEK | Methyl Ethyl Ketone |
MIBK | Iso Butyl Methyl Ketone |
MPK | Methyl Propyl Ketone |
NMP | N-Methyl Pyrrolidone |
PGMEA | Propylene glycol monomethyl ether acetate also known as “PM Acetate”, Positive Resist Solvent |
Strippers | Solvent Mixtures used to remove Photoresists |
TEOS | Tetra Ethyl Ortho Silicate |